Relation between Local Composition, Chemical Environment and Phase Shift Behavior in Cr-Based Oxycarbonitride Thin Films

The latest deep ultra-violet (DUV) photomask technology requires macroscopic properties such as optical transmission, reflectance, and chemical reactivity to be precisely controlled. Therefore, a fundamental understanding of the relationship between atomic bonding and nanometer scale property variation is required. Thin films of Cr-OC-N are compositionally graded to produce specific attenuation and phase shift of optical radiation. A combination of techniques was used to relate the local atomic bonding to macroscopic properties. Sputtered neutral mass spectroscopy was used to resolve local composition, and variable angle spectroscopic ellipsometry was used to determine local optical properties (on nm scale) that are then related to local composition. Core level shifts in X-ray photoelectron spectroscopy characterize changes in the Cr environment associated with changes in composition. A model is suggested in which bonding at the atomic level is controlled within different 10-100 nm sized regions which can be combined to produce arbitrary optical properties.